DO-HEYOUNG KIM'S RESEARCH GROUP
CHEMICAL PROCESS LABORATORY FOR ADVANCED MATERIALS (CPLAM)
RESEARCH EXPERTISE
NEWS@CPLAM
-
Developing process technology for diffusion prevention film using plasma deposition technique for wiring of semiconductor IC devices by using chemical vapor deposition (CVD) and atomic layer deposition (ALD).
-
Designing of the nanostructured materials by using various wet-chemical & dry-chemical processes.
-
Active application research areas: Electrochromic devices, Hybrid supercapacitors, solar cell devices, Photocatalysis, water splitting (OER & HER), Electrocatalysis, and Sensors.
Currently, we are looking for highly motivated postdoctoral and Ph. D candidates.
-
Welcome Dr. Venkatesan Jayaraman and Dr. Seenivasan Selvaraj on joining CPLAM .
-
Congratulations to Dr. Kavin on publishing in JMCA, Nano Energy, ACS Applied Materials and Interfaces, and Applied Surface Science.
-
Welcome Ms. Manasi Murmu as doctoral researcher in CPLAM
-
Welcome Mr. Noh Gi-hyeok, and Mr. Jang Gang Hyun as undergraduate research assistants.
-
Congratulations Mr. Amarnath on first publication in Nano Energy.
-
Congratulations to Dr. Kavin on getting married, we wish you a very happy married life.
-
Warm welcome to Dr. T. Kavinkumar to join in CPLAM as postdoctoral researcher.
-
Welcome Mr. Wi and Mr. Park as undergraduate assistants at CPLAM.
-
Congratulations to Jang Woo Sung for selection in DowDuPont company
-
Congratulations to Ji Su Hyeon on completion of masters course and joining LG Chemicals company
-
Dr. Nilesh's paper is accepted in Small-Wiley
-
Dr. Sangeeta's paper is accepted in App. Cat. B: Environmental-Elsevier
-
Welcome Mr. Amarnath as Int. Ph.D. student at CPLAM.