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DO-HEYOUNG KIM'S RESEARCH GROUP
CHEMICAL PROCESS LABORATORY FOR ADVANCED MATERIALS (CPLAM)
RESEARCH INTERESTS

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Atomic Layer Deposition (ALD) of spinels and perovskites materials (Ti, Ni, Zn, Co, La, Fe)
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Development of Powder ALD reactors for coating porous materials and nanoparticles
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Quartz Crystal Microbalance-ALD (QCM-ALD)
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Advanced Functional Materials for energy storage and conversion (supercapacitors, batteries, solar cells, electrochromism, IC devices, sensors)
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Analyzing the materials physical and chemical properties via structural, morphological, optical, electrical and funtional characterizations.
ATOMIC LAYER DEPOSITION & ITS ACTIVE APPLICATIONS


ALD Growth of NiO

ALD NiO on Hydrothermally Grown Fe2O3

ALD Fe2O3 on patterned Si(100) substrate

ENERGY STORAGE & CONVERSION

ENVIRONMENTAL REMEDIATION & DETECTION

MATERIALS FOR OTHER APPLICATIONS
SUPERCAPACITORS


WATER-SPLITTING
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